Micro / Nano Replication at its Best.
Optimized for the production of nanostructures, the Nano imPrinting Stepper NPS300 is the first ever tool able to combine aligned Hot Embossing and UV-NIL on a same platform. The NPS300 is able to print sub-20 nm geometries with an overlay accuracy of 250 nm.
The NPS300 demonstrates proven cutting-edge technology solutions that meet the economic requirements both for R&D and production.
Its flexible architecture offers an excellent process reproducibility and a unique ability to pattern large areas, in a sequential step and repeat mode on wafers up to 300 mm.
The NPS300 is available either as manually loaded or as a fully automated system with wafer loading capability.
Nanoimprinting lithography tool combining Hot Embossing and UV-NIL on wafer up to 300 mm in a Step & Repeat mode
The sub-20 nm printing resolution and 250 nm overlay accuracy address many applications: patterned media storage, optics, bio, etc...
Possibility to add inert gas for faster print
High accuracy and low volume fluid dispense
Automatic stamp pick-up for higher flexibility and stamp size from 50 / 65 mm extendable up to 100 mm
Manual or automated wafer loading / unloading
Air bearing technology and granite structure ensure long-term stability and reliability
Click here to request the NPS300 Datasheet.
The Step & Stamp Imprinting Lithography for Hot Embossing or UV NIL is an innovative method that has been demonstrated at the VTT Technical Research Centre of Finland.
Hot Embossing Lithography: this method consists of transferring the stamp pattern into a thermoplastic embossing material by controlling heat and pressure
UV-NIL: the Step & Cure method is using in-situ imprinting material dispensing and UV curing. This cutting-edge technology is a very promising solution for replacing standard UV-lithography systems when sub-20 nm resolution is required.
High precision micro-optical arrays and gratings
High resolution OLED displays
High density HDD’s for mobile storage
Other emerging techniques
Low cost production solutions of nanostructures are in development that may be the driving forces of Semiconductor, MOEMS and optoelectronics technology tomorrow. In particular, Nanoimprint lithography (NIL) and its variations have been developed as a cost-effective alternative to high-resolution e-beam lithography to print sub-20 nm geometries.
Imprinting is based on the principle of mechanically pressing thin polymer film with a stamp containing the nanopattern, in a thermo-mechanical or UV curing process. The patterned polymer can act as a final device, e.g. lense for imaging sensors, micro fluidic chip, biomedical array etc. It can also be used as a high resolution mask for subsequent steps of the process.
Imprinting is a straightforward lithography technology. There are three basic process steps:
Align the stamp with the substrate which has been pre-coated with the imprinting material
Press the stamp into the imprinting material to transfer the pattern
written on the stamp surface
Separate the stamp from the imprinting material
We can describe three imprinting or embossing techniques: Hot Embossing Lithography (HEL) using thermal plastic material, UV-NIL using a liquid resist which is then cured with UV light after molding and Soft Lithography which transfers ink previously applied to a soft stamp onto a substrate using a stamping method.