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 Focus on Bonding!

Title Date Abstract From

 A 10 μm Pitch Interconnection Technology using Micro Tube Insertion into Al-Cu for 3D Applications

ECTC 2011

This material is posted here with permission of IEEE.

Future 3-D applications require a very low pitch for interstrata vertical interconnection. The last ITRS assessment for vertical interconnection predicts a need for...

 CEA – LETI, MINATEC, LEM3 –CNRS/UPV-M

 Low-Profile 3D Silicon-on-Silicon Multi-chip Assembly

ECTC 2011

This material is posted here with permission of IEEE.

The focus of this paper is multi-chip 3D silicon-on-silicon assembly using low-profile lead-free (Sn-Cu) solder interconnects.

 IBM T.J. Watson Research Center

Low Temperature Bonding of High Density Large Area Array Interconnects for 3D Integration

IMAPS 2010

This material is posted here with permission of Imaps.

The results of bonding and stress testing of Cu/Sn-Cu bonded dice and Cu-Cu thermo-compression bonded dice....

 RTI International

Embedded active device packaging technology for real DDR2 memory chips

IWLPC
October 2010

Originally published in the IWLPC Proceedings

As high-speed, high-density, and high-performance are the primary IC development targets, packaging becomes key technology...

 Industrial Technology Research Institute (ITRI)

Fabrication and performance of InAs/GaSb-based superlattice LWIR detectors

SPIE Defense, Sensing
& Security
June 2010

Copyright 2010 SPIE

InAs/GaSb-based type II superlattices (T2SL) offer a manufacturable FPA technology with FPA size, scalability and cost advantages over HgCdTe.

 HRL Laboratories

Ultrathin 3D ACA FlipChip-In-Flex Technology

ECTC
June 2010

This material is posted here with permission of IEEE.

Die thickness of common, high-volume chip stacks range between 50-100 µm while thinning industry aims towards ultrathin...

 Berlin Technical University, NB Technologies and Fraunhofer IZM.

Three Chips Stacking with Low Volume Solder Using Single Re-Flow Process

ECTC
June 2010

This material is posted here with permission of IEEE.

Miniaturized 3D package with shorter distances between chips are needed for the mobile and high frequency applications.

 Institute of Microelectronics - A*STAR

Insertion Bonding: A Novel Cu-Cu Bonding Approach for 3D Integration

ECTC
June 2010

This material is posted here with permission of IEEE.

A novel low temperature Cu-Cu bonding approach called the insertion bonding technique has been developed.

 IMEC and the Katholieke Universiteit Leuven

 Technical Bulletin N°3

February 2010

The SET Technical Bulletin is a compilation of  technical articles written by our clients. Each article provides unique insights into the exciting area of C2W and C2C bonding.

 CEA-Leti, IMEC, ITRI, IME-A*Star, RTI, etc...

RF MEMS and flip-chip for space flight demonstrator

June 2009

The next generation of telecommunication satellites payloads will require higher performances and higher..

 Thales Alenia Space


Electrical characterization of high count, 10 µm pitch, room-temperature vertical interconnections.

Imaps
Device Packaging
 March 2009

This material is posted here with permission of Imaps.

In order to increase the format of heterogeneous staring arrays to 2Kx2K pixels or even larger complexities, limited substrate size and cost...

 CEA-LETI

New Reflow Soldering and Tip in Buried Box (TB2) Techniques For Ultrafine Pitch Megapixels
Imaging Array.

ECTC
May 2008

This material is posted here with permission of IEEE.

Flip chip is a high-density and highly reliable
interconnection technology which is mandatory for the
fabrication of high end  imaging arrays.

 CEA-LETI

 Focus on Nanoimprinting!

Title

Date

Abstract

From

NaPa "Library of Processes"

January 2010

This FREE 152 pages book gives all directions needed to chose and apply an alternative nano-patterning technique: it is a must read for all! 

NaPANIL

Access to NaPANIL's website:
=> Please click on Direct Link to download it!

UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale

November 2008

Imprint specific process parameters like the residual layer thickness and the etch resistance of the UV polymers for the substrate etch process have to be optimized to introduce UV nanoimprint lithography (UV NIL) as a high-resolution, low-cost patterning technique...

IISB

Access to
IISB's Library:

=> Please click on Begin Search, type "schmitt" as person  and "nanoimprint" as keyword.

=> Then you will access to all latest papers!

UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale

September 2008

It's a poster

 IISB

UV nanoimprinting lithography using nanostructured quartz molds with antisticking functionalization

February 2008

In this paper, we report the results obtained by the application of the SET FC150 equipment for UV-NIL...

 CNR-IMM

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Areas of interest:
3D Interconnect – SIP packaging
MEMS bonding
Optoelectronics and photonic packaging
FPA – IR Sensors / XR detectors
RF applications
Nanoimprint Lithography – Hot Embossing
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