FC300 High Force Die / Flip Chip Bonder


 Features and Benefits

 ± 0.5 µm post bond accuracy and 20 µradians leveling guarantee highest quality for the most advanced products
 Bonding of devices up to 100 x 100 mm onto wafer up to 300 mm to enable large format assemblies
 NIL configuration as add-on to bonding capability for maximum flexibility
 Optional Gas Confinement Chamber with inert or reducing gas for in-situ removal of oxides during bonding
 Air bearing construction on a granite structure ensures long-term stability and reliability
 Optional integrated chamber for gang reflow in a gas or vacuum environment


 High End Processes

Die Bonding (Face Up), Flip Chip Bonding (Face to Face), Mass Reflow, In-Situ Reflow, Fluxless Eutectic Bonding, Thermocompression Bonding, Ultrasonic Bonding, UV-Curing Bonding, Adhesive Bonding, UV-NIL, Hot Embossing Lithography...


 FC300 Technical Specifications
 SET's demo capabilities
Device Bonding Applications
Nanoimprint Lithography
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