Micro/Nano Replication at its Best.

Low cost production solutions of nanostructures are in development that may be the driving forces of Semiconductor, MOEMS and optoelectronics technology tomorrow. In particular, Nanoimprint lithography (NIL) and its variations have been developed as a cost-effective alternative to high-resolution e-beam lithography to print sub-20 nm geometries.			8-nm Pillars*
Imprinting is based on the principle of mechanically pressing thin polymer film with a stamp containing the nanopattern, in a thermo-mechanical or UV curing process. The patterned polymer can act as a final device, e.g. lense for imaging sensors, micro fluidic chip, biomedical array etc. It can also be used as a high resolution mask for subsequent steps of the process.			Imprint 30-60*
Imprinting is a straightforward lithography technology. There are three basic process steps:  Align the stamp with the substrate which has been pre-coated with the imprinting material  Press the stamp into the imprinting material to transfer the pattern written on the stamp surface  Separate the stamp from the imprinting material			Imprint Dots AFM*
We can describe three imprinting or embossing techniques: Hot Embossing Lithography (HEL) using thermal plastic material, UV-NIL using a liquid resist which is then cured with UV light after molding and Soft Lithography which transfers ink previously applied to a soft stamp onto a substrate using a stamping method. Any questions? info@set-sas.fr			Imprinted Wafers* *Courtesy of VTT