UV-NIL

 

Nano Imprint Lithography (NIL) permits to replicate patterns which dimensions can be as small as few tens or hundreds of nanometers. Two main processes exist:

UV-NIL is a nanoimprint method that is based on in-situ material dispense and then using controlled subsequent UV-curing and pressure. Depending on application requirements, the photoresist can be dispensed after or before the alignment.